Menu
Contact Sales
Inquivix Technologies hydrogen and ozone generation systems installed in a semiconductor cleanroom
Solutions Catalog

Hydrogen and Ozone
Generation Systems for Semiconductor Manufacturing

Inquivix Technologies supplies hydrogen and ozone functional water and gas systems purpose-built for the purity, stability, and process integration requirements of advanced semiconductor manufacturing. Every system is designed for direct integration with existing fab infrastructure, including ultrapure water distribution networks, wet bench tools, and automated process control via SECS/GEM communication protocols.

Talk to Engineering Korea Market Entry
Jump to H2 Water H2 Gas O3 Water O3 Gas

99.999%

H₂ Purity (5N Grade)

PEM electrolysis

≤ 300 g/Nm³

Ozone Concentration

Proprietary cell design

20–100 LPM

UPW Flow Range

Hollow-fiber contactor

SECS/GEM

Process Control

MES integration ready

Product Categories

Four Semiconductor-Grade Generation Platforms

Each platform is engineered as a complete fab-ready system, from electrochemical core, to UPW-compatible material set, to SECS/GEM process control. Select a category for specification sheets, application notes, and integration drawings.

Hydrogen water generator unit in cleanroom installation
01 H₂ Water
01
  • Wafer cleaning
  • Surface passivation
  • Wet bench integration

Dissolved Hydrogen Water Systems

Dissolved hydrogen water generators for semiconductor wafer cleaning and surface passivation. Each system generates high-purity hydrogen through PEM electrolysis and dissolves it into deionized water via a PFA hollow fiber membrane contactor, delivering stable dissolved hydrogen concentrations directly to the point of use in semiconductor wet processing environments.

1.0–2.0 ppm Dissolved H₂20–100 LPM UPW FlowPEM ElectrolysisSECS/GEM
View Hydrogen Water System Specifications
On-site hydrogen gas generator unit
02 H₂ Gas
02
  • Forming gas anneal
  • Carrier gas
  • Reducing atmosphere

Hydrogen Gas Generators

On-site hydrogen gas generators producing semiconductor-grade hydrogen at 99.999% purity (5N) using solid polymer electrolyte (PEM) cell technology. Replaces compressed hydrogen cylinder delivery with a safer, continuous, and more cost-effective source of high-purity H₂ gas for forming gas annealing, carrier gas supply, and reducing atmosphere applications in semiconductor manufacturing.

99.999% H₂ Purity (5N)1–4 Nl/min OutputCE / UL CertifiedSECS/GEM
View Hydrogen Gas Generator Specifications
Ozone water generator with UV destruction module
03 O₃ Water
03
  • Photoresist strip
  • Surface oxidation
  • SPM alternative

Ozone Water Systems

Ozone water generators that dissolve high-concentration ozone into ultrapure water for semiconductor wafer cleaning, photoresist stripping, and controlled surface oxidation. Provides a chemical-free oxidation alternative to sulfuric peroxide mixtures (SPM) in applicable cleaning steps, reducing hazardous waste output and lowering chemical operating costs.

10–100 ppm O₃ in DI Water400% UV Ozone DestructionHMI Touch PanelSECS/GEM
View Ozone Water System Specifications
High-concentration ozone gas generator
04 O₃ Gas
04
  • Oxidation
  • CVD/ALD precursor
  • Cleaning chamber

Ozone Gas Generators

High-concentration ozone gas generators delivering up to 300 g O₃/Nm³ with adjustable oxygen flow rates from 5 to 40 slm. Proprietary internal cell design maximizes ozone output while minimizing oxygen consumption. Compact footprint enables integration into space-constrained semiconductor fab environments.

≤ 300 g O₃/Nm³5–40 slm O₂ FlowProprietary Cell DesignCE / UL CertifiedSECS/GEM
View Ozone Gas Generator Specifications
Integration Standards

Engineered for Semiconductor Fab Integration

Every hydrogen and ozone system supplied by Inquivix Technologies supports SEMI SECS/GEM communication protocols for automated process control and MES integration. All UPW hydrogen system and ozone water system configurations are constructed from UPW-compatible materials, electropolished stainless steel, PTFE, PFA, and PVDF, maintaining water resistivity above 18.2 MΩ·cm and TOC below 5 ppb at the point of use. Hydrogen gas generators and ozone gas generators carry CE and UL safety certifications.

SEMI E5 / E30

SECS/GEM Process Control

Every platform supports SEMI SECS/GEM communication for automated process control and MES integration. Recipe management, status reporting, and alarm handling map directly into existing fab control systems.

Protocol
SECS-II / GEM
Integration
MES-ready
SEMI F57

UPW-Compatible Wetted Materials

All UPW-contacting paths are constructed from electropolished stainless steel, PTFE, PFA, and PVDF. Designed to preserve water quality through the point of use without leaching, particle shedding, or TOC contribution.

Resistivity
≥ 18.2 MΩ·cm
TOC
< 5 ppb
CE / UL

Certified for Regulated Environments

Hydrogen gas generators and ozone gas generators carry CE and UL safety certifications. Internal interlocks, sensor monitoring, and auto-shutdown logic meet semiconductor fab safety requirements for combustible and oxidizing gas streams.

Marks
CE · UL
Safety
Auto-shutdown
Contact Our Engineering Team Korea Market Entry Technical Notes
Next Steps

Discuss Your Fab Integration Requirements

Our engineering team supports specification review, on-site integration planning, and SECS/GEM commissioning for hydrogen and ozone systems in semiconductor manufacturing environments.

Contact Our Engineering Team Korea Market Entry
Technical Notes hello@inquivixtech.com Incheon, Republic of Korea